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Process Modeling of Chemical Mechanical Planarization. An Integrated Model from Abrasive Scale to Chip Scale; Basics, Characterizations, Modeling and Verification

Автор:

мягкая обложка
144 страниц
2008 год

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Книга по Требованию

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2413 руб

отсутсвует
на складе

Описание:

The model has been built from an abrasive scale to a chip scale, focusing on practical application for DFM while also considering CMP process conditions as key input parameters. This book summarizes key CMP applications and challenges in modern IC fabrication, and provides a comprehensive physical CMP process model that can be applied for process characterization, process optimization, consumable development, and layout design for manufacturing (DFM). However, mainly due to the high complexities coming from various interactions among mechanical reactions and chemical reactions, its fundamental working mechanism is still not fully understood. Also included are examples of a computer model application for pattern dependent variation in shallow trench isolation CMP and the model verification with specially designed test chip. The model should help CMP professionals, DFM engineers and students of IC fabrication obtain a fundamental understanding of CMP process and characterize and improve a process through real application. Chemical Mechanical Planarization (CMP) is one of the key enabling technologies for modern IC fabrication.

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"Круг моих научных интересов" как практика реальной рефлексии

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Process Modeling of Chemical Mechanical Planarization. An Integrated Model from Abrasive Scale to Chip Scale; Basics, Characterizations, Modeling and Verification  http://www.booksiti.net.ru/books/14178975

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